公开(公告)号：WO2022167177A1

公开(公告)日：2022-08-11

申请号：PCT/EP2022/050471

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： TEN BERGE, Gerardus, Ferdinandus ,  HENDRIKS, Jimi

IPC: G03F7/20 ,  G03F1/62

Abstract: There is described a lithographic apparatus including a membrane assembly and a radiation beam path, wherein the membrane assembly includes a membrane, the membrane being disposed in the radiation beam path, wherein the membrane assembly is configured to selectively move the membrane from a first position in the radiation beam path to a second position in the radiation beam path. Also described is a membrane assembly, a method of extending the lifespan of a membrane, and the use of such apparatuses and methods in a lithographic apparatus or process.

公开(公告)号：WO2021175797A1

公开(公告)日：2021-09-10

申请号：PCT/EP2021/055081

申请日：2021-03-01

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： LYONS, Joseph, Harry ,  HENDRIKS, Jimi ,  ZHOU, Ping ,  HUANG, Zhuangxiong ,  JILISEN, Reinier, Theodorus, Martinus

IPC: G03F7/20

Abstract: Embodiments herein describe methods, devices, and systems for rupture detection and end-of- life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.