公开(公告)号：WO2023072526A1

公开(公告)日：2023-05-04

申请号：PCT/EP2022/077282

申请日：2022-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BASTANI, Vahid ,  KNOPS, Raoul, Maarten, Simon ,  THEEUWES, Thomas ,  URBANCZYK, Adam, Jan ,  WILDENBERG, Jochem, Sebastiaan ,  VAN WIJK, Robert Jan

IPC: G03F7/20

Abstract: 2021P00202WO 19 Confidential ABSTRACT Disclosed is a method of determining a performance parameter distribution and/or associated quantile function. The method comprises obtaining a quantile function prediction model operable to predict a quantile value for a substrate position and given quantile probability such that the predicted quantile values vary monotonically as a function of quantile probability and using the trained quantile 5 function prediction model to predict quantile values for a plurality of different quantile probabilities for one or more locations on the substrate.

公开(公告)号：WO2016087177A1

公开(公告)日：2016-06-09

申请号：PCT/EP2015/076637

申请日：2015-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  KNOPS, Raoul, Maarten, Simon ,  STREEFKERK, Bob ,  VALENTIN, Christiaan, Louis ,  VAN SCHOOT, Jan, Bernard, Plechelmus ,  SIMONS, Wilhelmus, Franciscus, Johannes ,  MERKX, Leon, Leonardus, Franciscus ,  DE JONGH, Robertus, Johannes, Marinus ,  MERRY, Roel, Johannes, Elisabeth ,  YPMA, Michael, Frederik

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/705 ,  G03F7/706

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1 - S4); one or more actuators (A1 - A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1 - M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

Abstract translation: 用于光刻设备的投影系统（PS1）包括：光路（100）; 多个传感器（S1-S4）; 一个或多个致动器（A1-A4）; 和控制器（CN）。 光路可操作以接收输入辐射束（Bin）并将输出辐射束（Bout）投影到衬底上以形成图像。 光路包括：多个光学元件（M1-M4），所述多个光学元件包括：第一组至少两个光学元件（M1，M4）和第二组至少一个光学元件（M2， M3）。 每个传感器与多个光学元件中的一个相关联，并且可操作以确定该光学元件的位置。 每个致动器与第二组光学元件中的一个相关联，并且可操作以调节该光学元件。 控制器可操作以使用一个或多个致动器来根据所确定的第一组光学元件的位置来调整第二组光学元件，以便至少部分地补偿光学像差和/或视线 由第一组光学元件的位置引起的误差。