INTERFEROMETER SYSTEM AND LITHOGRAPHIC APPARATUS

    公开(公告)号:WO2021170333A1

    公开(公告)日:2021-09-02

    申请号:PCT/EP2021/051901

    申请日:2021-01-28

    Abstract: The invention relates to an interferometer system comprising a light source to provide a radiation beam, an optical fiber, and an optical unit arranged on an object of interest comprising a fiber end holding device to hold a measurement end of the optical fiber, and a reflector arranged on the object of interest. The measurement end of the optical fiber being arranged to partially transmit and partially reflect the radiation beam to split the radiation beam in a measurement beam and a reference beam, the optical unit is arranged to direct the measurement beam to a reflective surface on the reference object, the reflector is arranged to reflect the measurement beam after reflection on the reflective surface back to the reflective surface, the optical unit is arranged to receive the reflected measurement beam and guide the reflected measurement beam to the end surface.

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