-
公开(公告)号：WO2023083582A1
公开(公告)日：2023-05-19
申请号：PCT/EP2022/079327
申请日：2022-10-20
Applicant: ASML NETHERLANDS B.V.
Inventor： LEVY, Keane, Michael , NG, Amy
IPC: G03F7/20
Abstract: Disclosed is an apparatus for and method of using an in-system utility stage to provide service functions for wafer tables and other components in the photolithographic system in which the utility stage can access multiple tools without any need to open an enclosure containing the utility stage and the wafer tables and other components thus increasing throughput and decreasing downtime.
Search Results
1
records
(took 0.006 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
