METROLOGY SYSTEM FOR EXTREME ULTRAVIOLET LIGHT SOURCE

    公开(公告)号:WO2022243006A1

    公开(公告)日:2022-11-24

    申请号:PCT/EP2022/061382

    申请日:2022-04-28

    Abstract: A metrology system includes: a light apparatus, a detection apparatus, and a control apparatus in communication with the detection apparatus. The light apparatus is configured to generate an optical probe propagating along a probe optical axis that intersects a target axial path at a probe region, the target axial path extending primarily along an X axis of an X, Y, Z coordinate system. The detection apparatus is configured to detect produced light at a plurality of distinct wavelengths, each wavelength associated with a distinct location along an X-transverse axis of the X, Y, Z coordinate system, the produced light being produced from an interaction in the probe region between the optical probe and a target traveling along the target axial path. The control apparatus is configured to analyze the detected light and determine position information relating to the target along the X-transverse axis of the X, Y, Z coordinate system.

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