公开(公告)号：WO2021156387A1

公开(公告)日：2021-08-12

申请号：PCT/EP2021/052705

申请日：2021-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： FU, Chenxi ,  DI, Long ,  KUINDERSMA, Lucas ,  TSENG, Kuo-Feng ,  HEMPENIUS, Peter, Paul ,  LIU, Yu ,  LUO, Ying

IPC: H01J41/12 ,  F16L23/032

Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.

公开(公告)号：WO2019048293A1

公开(公告)日：2019-03-14

申请号：PCT/EP2018/073161

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： TSENG, Kuo-Feng ,  DONG, Zhonghua ,  WANG, Yixiang ,  CHEN, Zhongwei

IPC: H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.

公开(公告)号：WO2019043204A1

公开(公告)日：2019-03-07

申请号：PCT/EP2018/073548

申请日：2018-08-31

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： BAGGEN, Marcel, Koenraad, Marie ,  ARENDS, Antonius, Henricus ,  KUINDERSMA, Lucas ,  VAN DE RIJDT, Johannes, Hubertus, Antonius ,  HEMPENIUS, Peter, Paul ,  VAN KEMPEN, Robertus, Jacobus, Theodorus ,  BOSCH, Niels, Johannes, Maria ,  VAN DE GROES, Henricus, Martinus, Johannes ,  TSENG, Kuo-Feng ,  BUTLER, Hans ,  RONDE, Michaël, Johannes, Christiaan

IPC: H01J37/20

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.