公开(公告)号：WO2021249768A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/063942

申请日：2021-05-25

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： DE GROOT, Antonius, Franciscus, Johannes ,  AKBAS, Mehmet, Ali ,  CIFTCI SANDIKCI, Aysegul ,  DENG, Jerry, Jianguo ,  NEKLYUDOVA, Mariya ,  MAYER, Ryan ,  GUPTA, Sonia ,  STENEKEN, Ryan, Charles ,  VAN DE WINKEL, Jimmy, Matheus, Wilhelmus ,  OLEXOVITCH, Christopher M. ,  PERRY, Michael

IPC: G03F7/20 ,  H01L21/687 ,  G03F7/707 ,  G03F7/7095 ,  H01L21/6875 ,  H01L21/68757

Abstract: Described herein is a method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a plurality of burls projecting from the substrate holder and each burl having a distal end surface configured to engage with a substrate. The method including applying, via a plasma enhanced chemical vapor deposition, a coating of a wear-resistant material at the distal end surface of one or more burls of the plurality of burls. The applying of the coating includes adjusting radio frequency (RF) power of RF electrodes in a range 100 to 1000 W for creating plasma; and exposing, in a chamber, the one or more plurality of burls to a precursor gas at a gas flow rate between 20 to 300 seem, the pre-cursor gas being Flexane.