DISPENSING SYSTEM
    2.
    发明申请
    DISPENSING SYSTEM 审中-公开

    公开(公告)号:WO2021177815A1

    公开(公告)日:2021-09-10

    申请号:PCT/NL2021/050135

    申请日:2021-03-01

    IPC分类号: B65D83/36

    摘要: The present invention relates to a dispensing system for spraying a liquid/gas mixture, the system comprising a dispenser and a holder in which the dispenser is held, the dispenser comprising a container that is adapted for holding therein a liquid phase and a gas phase that is at a pressure of 2 bar or greater and is in direct contact with the liquid phase. The dispensing system may be used in a first orientation and a second orientation, wherein the ratio of liquid to gas in the sprayed mixture is different depending on the orientation of the system during spraying.

    CRYOGENIC APPLICATOR
    3.
    发明申请

    公开(公告)号:WO2020148318A1

    公开(公告)日:2020-07-23

    申请号:PCT/EP2020/050881

    申请日:2020-01-15

    摘要: An applicator for applying cryogenic fluid to a treatment area is described, the applicator comprising:a reservoir (12) configured to contain a cryogenic fluid comprising a gas phase (G) and a liquid phase (L). A nozzle (20) extends from a proximal end arranged in fluid communication with the reservoir (12) to an open distal end (21) for application of fluid to a treatment area. An actuatable valve is provided to selectively allow a flow of cryogenic fluid from the reservoir (12) through the distal end of the nozzle (20). A spacer (14) extends distally beyond the distal end (21) of the nozzle (20), the spacer (14) comprising a skin contacting surface (14a) at its distal end. A porous material (16) is provided between the distal end (21) of the nozzle (20), at least between the open end of the nozzle and the skin contacting surface of the spacer.