公开(公告)号：WO2018052318A1

公开(公告)日：2018-03-22

申请号：PCT/NO2017/050235

申请日：2017-09-19

Applicant: DYNATEC ENGINEERING AS

Inventor： FILTVEDT, Werner O.

IPC: C01B33/027 ,  H01M4/134 ,  H01M4/1395 ,  H01M4/38

Abstract: Method for producing silicon particles for use as anode material in lithium ion rechargeable batteries, distinctive by the steps: a)optionally, to introduce silicon seed particles and/or lithium seed particles into, or producing silicon or lithium seed particles or inner core material in a rotatable reactor, as a separate optional step or as included in step b), b)to introduce a silicon-containing first reaction gas for CVD into the reactor, setting the reactor in rotation under CVD-conditions; to grow silicon-rich core particles on the seed particles while the reactor is rotated at a rotational speed creating a centripetal acceleration exceeding at least 1000 times the natural acceleration of gravity on said core particles, c)optionally, to introduce a second reaction gas, liquid or material into the reactor of steps a) and b) or a second reactor into which the core particles of step b) have been introduced; to grow a second material of lower silicon contents than the core material, and the second reaction gas, liquid or material is different from the first reaction gas. The invention also provides silicon particles for use as anode material in lithium ion rechargeable batteries, use of a rotating reactor for the method, and a reactor for operating the method.

Abstract translation: 用于生产用作锂离子可再充电电池中的阳极材料的硅颗粒的方法，其特征在于以下步骤：a）任选地，将硅晶种颗粒和/或锂晶种颗粒引入或制造硅或 作为单独的任选步骤或包括在步骤b）中的锂晶种颗粒或内芯材料，b）将用于CVD的含硅第一反应气体引入到反应器中，使反应器在CVD- 条件; 在所述种子颗粒上生长富硅核颗粒，同时所述反应器以旋转速度旋转，产生超过所述核颗粒上的自然重力加速度的至少1000倍的向心加速度，c）任选地，引入第二反应气体， 液体或材料引入步骤a）和b）的反应器或第二反应器，其中引入了步骤b）的核心颗粒; 以生长比芯材料更低的硅含量的第二材料，并且第二反应气体，液体或材料不同于第一反应气体。 本发明还提供用作锂离子可充电电池中阳极材料的硅颗粒，该方法使用旋转反应器，以及操作该方法的反应器。

公开(公告)号：WO2013048258A1

公开(公告)日：2013-04-04

申请号：PCT/NO2012/050184

申请日：2012-09-25

Applicant: DYNATEC ENGINEERING AS

Inventor： FILTVEDT, Werner O. ,  FILTVEDT, Josef

IPC: C01B33/027 ,  C01B33/029 ,  C01B33/03 ,  C01B33/035 ,  C23C16/01 ,  C23C16/24

CPC classification number: H01L21/0262 ,  C01B33/027 ,  H01L21/02532

Abstract: The invention provides a reactor for the manufacture of silicon by chemical vapour deposition (CVD), the reactor comprises a reactor body that can rotate around an axis with the help of a rotation device operatively arranged to the reactor, at least one sidewall that surrounds the reactor body, at least one inlet for reaction gas, at least one outlet for residual gas and at least one heat appliance operatively arranged to the reactor. The reactor is characterised in that during operation for the manufacture of silicon by CVD, the reactor comprises a layer of particles on the inside of, at least, one sidewall.

Abstract translation: 本发明提供了一种用于通过化学气相沉积（CVD）制造硅的反应器，该反应器包括反应器主体，该反应器主体可借助于可操作地布置到反应器的旋转装置围绕轴旋转，至少一个侧壁围绕 反应器主体，用于反应气体的至少一个入口，用于残余气体的至少一个出口和至少一个可操作地布置在反应器上的加热器具。 反应器的特征在于，在通过CVD制造硅的操作期间，反应器包括在至少一个侧壁的内侧上的一层颗粒。

公开(公告)号：WO2017209624A1

公开(公告)日：2017-12-07

申请号：PCT/NO2017/050137

申请日：2017-05-30

Applicant: DYNATEC ENGINEERING AS

Inventor： FILTVEDT, Josef ,  FILTVEDT, Werner O.

IPC: A21C3/02

Abstract: The invention relates to a device for processing a sheet of dough (3) in order to reduce the thickness of this, where the device comprises a plurality of roller (7) arranged in series on a roller assembly (17, 17', 22). The invention is distinctive in that each roller (7) is configured to follow a curved path (5, 6, 26) when the roller (7) is in contact with the sheet of dough (3) so that curved structures (10, 11, 13) are created in the sheet of dough (3) after processing. The invention also comprises a method for processing a sheet of dough (3).

Abstract translation: 本发明涉及一种用于加工一片面团（3）以减少其厚度的装置，其中该装置包括多个在滚子组件（7）上串联设置的滚子（7） （17,17'，22）。 本发明的独特之处在于，当滚筒（7）与面片（3）接触时，每个滚筒（7）被配置为遵循弯曲路径（5,6,26），使得弯曲结构（10,11 ，13）在加工后在面团片（3）中形成。 本发明还包括一种加工一片面团（3）的方法。