公开(公告)号：WO1991018312A1

公开(公告)日：1991-11-28

申请号：PCT/US1991003226

申请日：1991-05-09

Applicant: GENERAL SIGNAL CORPORATION

Inventor： GENERAL SIGNAL CORPORATION ,  MARKLE, David, A.

IPC: G02B17/00

CPC classification number: G03F1/62 ,  G02B13/26 ,  G02B17/008 ,  G02B17/08 ,  G02B17/0892 ,  G03F1/26 ,  G03F1/52 ,  G03F7/70225 ,  G03F7/70283

Abstract: An optical projection system has been provided which is particularly suited for use in microlithography and includes a source of exposure energy (40) for generating a beam of energy. A primary lens (50) and mirror are located in the path of the beam for receiving the beam and passing only a portion of the beam therethrough. A refractive lens group (58) is located in the path of the portion of the beam for receiving and transmitting that portion. A reticle element (80) is located in the path of the portion of the beam and has a uniform thickness having a pattern on one surface thereof and an unpatterned portion adjacent thereto. The reticle element (80) is positioned for permitting the portion of the beam to pass through its thickness and for reflecting the portion of the beam back through its thickness and the refractive lens group (58) to primary lens and mirror (50).

Abstract translation: 已经提供了一种光学投影系统，其特别适用于微光刻，并且包括用于产生能量束的曝光能量源（40）。 主透镜（50）和反射镜位于光束的路径中，用于接收光束并且仅使一部分光束通过其中。 折射透镜组（58）位于用于接收和传输该部分的光束部分的路径中。 光栅元件（80）位于光束的部分的路径中，并且具有在其一个表面上具有图案的均匀厚度和与其相邻的未图案化部分。 光栅元件（80）被定位成允许光束的一部分穿过其厚度并且用于将光束的该部分反射回其厚度，并将折射透镜组（58）反射到主透镜和反射镜（50）。