PROCESSING SYSTEMS WITH A PLURALITY OF SUPPLY RESERVOIRS

    公开(公告)号:WO2021194479A1

    公开(公告)日:2021-09-30

    申请号:PCT/US2020/024500

    申请日:2020-03-24

    Abstract: An example processing system for processing a part includes: a processing chamber to hold the part to be processed; a plurality of supply reservoir to contain respective processing fluids; an injection system fluidly coupled to the plurality of supply reservoirs; and a controller operatively coupled to the injection system, the controller to: based on the part to be processed, select a processing sequence for processing the part; and control the injection system to execute the selected processing sequence; wherein the processing sequence is selected from: (i) injecting, sequentially, a first volume of a first processing fluid and a second volume of a second processing fluid; and (ii) combining a third volume of a third processing fluid and a fourth volume of a fourth processing fluid to form a combined processing fluid and injecting the combined processing fluid into the processing chamber.

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