公开(公告)号：WO2019108831A2

公开(公告)日：2019-06-06

申请号：PCT/US2018/063124

申请日：2018-11-29

Applicant: MKS INSTRUMENTS

Inventor： CHIU, Johannes ,  CHEN, Xing ,  TAI, Chiu-Ying ,  HARRIS, Michael ,  GUPTA, Atul

Abstract: The present application is directed to a multi-sensor gas sampling detection system and method for detecting and measuring the radicals in a radical gas stream and includes at least one radical gas generator in communication with at least one gas source. The radical gas generator may be configured to generate at least one radical gas stream which may be used within a processing chamber. As such, the processing chamber is in fluid communication with the radical gas generator. At least one analysis circuit in fluid communication with the radical gas generator may be used in the detection and measurement system. The analysis may be configured to receive a defined volume and/or flow rate of the radical gas stream. In one embodiment, the analysis circuit may be configured to react at least one reagent with radicals within the defined volume of the radical gas stream thereby forming at least one chemical species within at least one compound stream. At least one sensor module within the analysis circuit may be configured to measure a concentration of the chemical species within the compound stream. One or more flow measurement modules may be in fluid communication with the sensor module. During use, the flow measurement module may be configured to measure the volume of at least one of the compound stream and radical gas stream.

公开(公告)号：WO2023086395A1

公开(公告)日：2023-05-19

申请号：PCT/US2022/049419

申请日：2022-11-09

Applicant: MKS INSTRUMENTS, INC.

Inventor： KOAI, Keith ,  YANG, Chenglong ,  ROSENZWEIG, Guy ,  LIU, Jimmy ,  HARRIS, Michael ,  BLESSING, James

IPC: H01J37/32

Abstract: An apparatus for feedback control in plasma processing systems using radical sensing, and a method for feedback control in plasma processing systems using radical sensing, the apparatus comprising at least one process gas supply system configured to output at least one process gas, at least one plasma source configured to receive the at least one process gas and generate at least one radical flow, at least one process chamber in communication with the at least one plasma source, wherein the process chamber receives the at least one radical flow and directs at least a portion of the at least one radical flow to one or more devices, the process chamber configured to output at least one process chamber output, at least one gas analyzer in communication with and configured to sample at least one of the at least one process gas, at least one radical flow, at least one radical flow within the at least one process chamber, and the at least one process chamber output, and at least one controller in communication with at least one of the process gas supply system, at least one plasma source, and at least one process chamber, the controller configured to generate at least one control signal based on data from the at least one gas analyzer and selectively control at least one of the process gas supply system, at least one plasma source, and at least one process chamber.

公开(公告)号：WO2019241405A1

公开(公告)日：2019-12-19

申请号：PCT/US2019/036796

申请日：2019-06-12

Applicant: MKS INSTRUMENTS, INC.

Inventor： HARRIS, Michael ,  TAI, Chiu-Yang ,  GUPTA, Atul

IPC: H05H1/00

Abstract: The present application discloses a device for radical monitoring a plasma source for a remote plasma source used in a processing system and includes at least one gas source, a plasma source body having at least one passage having at least one passage surface, a first thermal sensor receiver may be formed within the plasma source body proximate to the passage surface of the passage, a first thermal sensor positioned within the first thermal sensor receiver configured to measure a first temperature of the passage surface, a second thermal sensor receiver formed within the plasma source body proximate to the passage surface of the passage and configured to measure a second temperature of the passage surface of the passage at a second location.