公开(公告)号：WO1996002932A1

公开(公告)日：1996-02-01

申请号：PCT/IB1995000558

申请日：1995-07-13

申请人： PHILIPS ELECTRONICS N.V. ,  PHILIPS NORDEN AB

发明人： PHILIPS ELECTRONICS N.V. ,  PHILIPS NORDEN AB ,  OSBORNE, William ,  PRINSEN, Petrus ,  MONTIE, Edwin ,  COSMAN, Edward

IPC分类号： H01J29/62

CPC分类号： H04N9/28 ,  H01J29/488 ,  H01J29/62 ,  H01J2229/4827 ,  Y10T29/49099

摘要： A resistive focusing lens structure for an electron beam device wherein the total resistance of the focusing lens structure is larger than 2.5 G OMEGA and the absolute value of the temperature coefficient of resistance is smaller than 250.10 K . Preferably, said resistive focusing lens structure comprises a resistance layer of a fired suspension of a conductive material of a mixture of a lead ruthenate, a lead titanate and a ruthenium oxide in a glass formed of silicon dioxide, aluminum oxide and lead oxide.

摘要翻译： 一种用于电子束装置的电阻聚焦透镜结构，其中聚焦透镜结构的总电阻大于2.5G OMEGA，并且电阻温度系数的绝对值小于250.10K -1。 优选地，所述电阻聚焦透镜结构包括由二氧化硅，氧化铝和氧化铅形成的玻璃中的钌酸铅，钛酸铅和氧化钌的混合物的导电材料的烧结悬浮液的电阻层。