PHOTOELASTIC STRESS ANALYSIS
    1.
    发明申请
    PHOTOELASTIC STRESS ANALYSIS 审中-公开
    光致应力分析

    公开(公告)号:WO1993020419A1

    公开(公告)日:1993-10-14

    申请号:PCT/GB1993000256

    申请日:1993-02-08

    CPC classification number: G01L1/241

    Abstract: Polarized light from a polarizer (12) is passed through a stressed birefringent objet (14) and an analyser (16) to produce a fringe pattern representative of the stress in the object (14). The fringe pattern is observed with a CCD camera (18) and intensity information of the pattern is input to a computer (22). The process is repeated for at least two wavelengths of light and the information for the different wavelengths is combined to form a stress map of the object (14) for display on a VDU (24).

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