公开(公告)号：WO2017030979A1

公开(公告)日：2017-02-23

申请号：PCT/US2016/046827

申请日：2016-08-12

Applicant: THE TEXAS A&M UNIVERSITY SYSTEM

Inventor： BUKKAPATNAM, Satish ,  SRINIVASA, Arun ,  HUNG, Wayne N.p. ,  IQUEBAL, Asif ,  NAGARAJAN, Thiagarajan ,  AGUIRRE, Matthew Remy ,  GRAHAM, Kaitlyn

IPC: B24B31/112 ,  B24B31/00 ,  B24B31/10

CPC classification number: B24B31/112

Abstract: A magnetic field manipulated localized polishing system includes a container holding a volume of a magnetic abrasive fluid. The magnetic abrasive fluid contains abrasive particles. A motor is positioned under the container. A magnet is coupled to the motor such that the motor induces rotation of the magnet. A workpiece is suspended in the container.

Abstract translation: 磁场操纵局部抛光系统包括容纳一定体积的磨料流体的容器。 磁性磨料流体含有磨料颗粒。 电机位于容器下方。 一个磁体与马达相连，使马达引起磁铁的转动。 工件悬挂在容器中。