A METHOD OF MANUFACTURING A COATED POLYMER SUBSTRATE HAVING LOW EMISSIVITY
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    发明申请
    A METHOD OF MANUFACTURING A COATED POLYMER SUBSTRATE HAVING LOW EMISSIVITY 审中-公开
    制造具有低发射性的涂布聚合物基材的方法

    公开(公告)号:WO2017097779A1

    公开(公告)日:2017-06-15

    申请号:PCT/EP2016/079943

    申请日:2016-12-06

    IPC分类号: C08J7/04 B32B17/06 C23C14/08

    摘要: The invention relates to a method of manufacturing a coated polymer substrate having low emissivity properties and a high hardness. The method comprises the steps of providing a polymer substrate; applying at least one adhesion promoting layer on one side of said polymer substrate; applying at least one silica or silica-based layer on said at least one adhesion promoting layer by a sol-gel process. The invention further relates to a coated polymer substrate having low emissivity properties, to a glass substrate provided with a coated polymer substrate and to the use of such a coated substrate as substrate having low emissivity properties.

    摘要翻译: 本发明涉及制造具有低发射率性质和高硬度的涂覆的聚合物基材的方法。 该方法包括以下步骤:提供聚合物基材; 在所述聚合物基底的一侧上施加至少一个增粘层; 通过溶胶 - 凝胶工艺在所述至少一个增粘层上施加至少一个二氧化硅或二氧化硅基层。 本发明进一步涉及具有低发射率性质的涂覆的聚合物基底,设置有涂覆的聚合物基底的玻璃基底以及涉及使用这种涂覆的基底作为具有低发射率性质的基底。