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    A SYSTEM AND METHOD FOR EXTRUSION BASED MANUFACTURING OF A STRUCTURE
    1.
    发明申请
    A SYSTEM AND METHOD FOR EXTRUSION BASED MANUFACTURING OF A STRUCTURE 审中-公开

    公开(公告)号：WO2022106631A1

    公开(公告)日：2022-05-27

    申请号：PCT/EP2021/082326

    申请日：2021-11-19

    Applicant: VITO NV

    Inventor： MICHIELSEN, Bart ,  LEFEVERE, Jasper ,  VANGENEUGDEN, Dirk

    IPC: B29C64/106 ,  B29C64/393 ,  B33Y10/00 ,  B33Y50/02 ,  G06N3/00

    Abstract: A system (1) for manufacturing a three-dimensional structure comprising interconnected filaments (13) comprises a support, a deposition unit (5) and a controller configured to operate during a printing operation at least one nozzle (7) of the deposition unit for deposition of filaments on the support in a predetermined interconnected arrangement in a plurality of stacked layers. A sensor unit (23) is provided which is configured to monitor, at least during the printing operation, sensory data indicative of an actuation for performing deposition or sensory data indicative of at least one flow parameter of the build material. A trained machine learning model is provided which is configured to receive the sensory data as input, and to provide an output relating to control of at least one deposition control parameter for maintaining a predetermined deposition flow rate during the printing operation, and wherein the controller is configured to adjust, based on the output of the trained machine learning model, the at least one deposition control parameter during the printing operation. At least one sensor (23) of the sensor unit is arranged to monitor the sensory data at at least one location upstream of the nozzle opening area.

    A SYSTEM AND METHOD FOR MANUFACTURING THREE-DIMENSIONAL STRUCTURES
    3.
    发明申请
    A SYSTEM AND METHOD FOR MANUFACTURING THREE-DIMENSIONAL STRUCTURES 审中-公开

    公开(公告)号：WO2021148463A1

    公开(公告)日：2021-07-29

    申请号：PCT/EP2021/051195

    申请日：2021-01-20

    Applicant: VITO NV

    Inventor： VERHEYDE, Bert ,  LEFEVERE, Jasper ,  MICHIELSEN, Bart ,  VANGENEUGDEN, Dirk

    IPC: B29C64/106 ,  B29C64/182 ,  B29C64/25 ,  B29C64/255 ,  B33Y10/00 ,  B33Y30/00 ,  B29C64/321

    Abstract: A system and method for manufacturing three-dimensional structures is provided. The system comprises a plurality of printing stations for performing parallel printing in an confined space enclosed by a housing, wherein each printing station comprises a carrier, a deposition unit with at least one nozzle arranged for dispensing filaments of build material paste through an opening area thereof and a station controller configured to operate the deposition unit for deposition of filaments of a build material paste on the carrier in an interconnected arrangement in a plurality of stacked layers in order to form one or more three-dimensional structures, the at least one nozzle and the detachable carrier being relatively moveable with respect to each other, wherein the deposition unit is coupled to a reservoir unit configured to house the build material paste, wherein the reservoir unit includes at least one reservoir arranged outside of the confined space.

    METHOD FOR APPLYING A PROTECTIVE LAYER TO A METAL OR METAL ALLOY SURFACE, AND ARTICLE COMPRISING SUCH PROTECTIVE LAYER
    5.
    发明申请
    METHOD FOR APPLYING A PROTECTIVE LAYER TO A METAL OR METAL ALLOY SURFACE, AND ARTICLE COMPRISING SUCH PROTECTIVE LAYER 审中-公开

    公开(公告)号：WO2023021224A1

    公开(公告)日：2023-02-23

    申请号：PCT/EP2022/073362

    申请日：2022-08-22

    Applicant: VITO NV

    Inventor： RANGASAMY, Vijay Shankar ,  VANHULSEL, Annick ,  VANGENEUGDEN, Dirk

    IPC: C23C8/36 ,  H01M4/134 ,  H01M4/1395 ,  H01M4/36 ,  H01M4/38 ,  H01M4/62 ,  H01M10/052

    Abstract: The present invention discloses a method for applying a protective layer on at least part of an exposed surface of a substrate, the method comprising activating a nitrogen comprising gas by means of an atmospheric pressure plasma discharge in a plasma discharge chamber to obtain an activated gas, and contacting the exposed surface with an afterglow of the activated gas egressing from the plasma discharge chamber, wherein the protective layer is formed on at least part of the exposed surface; wherein the surface comprises a metallic element or an alloy thereof, the metallic element is an alkali metal or an alkaline earth metal, the surface and the plasma discharge chamber are moving relative one another during contacting the exposed surface with the afterglow of the activated gas. The invention is further related to an article, comprising a substrate and a protective layer, covering at least part of the substrate, sharing an interface comprising a metallic element of an alloy thereof, wherein the protective layer comprises a plurality of spaced apart pillars projecting from the interface, wherein the pillars are made of stacked layers of crystals of a nitride of the metallic element, and the stacked layers of crystals comprise a polyhedron shape.

    SURGICAL IMPLANTS COMPRISING GRADED POROUS STRUCTURES
    6.
    发明申请
    SURGICAL IMPLANTS COMPRISING GRADED POROUS STRUCTURES 审中-公开

    公开(公告)号：WO2018178313A1

    公开(公告)日：2018-10-04

    申请号：PCT/EP2018/058245

    申请日：2018-03-29

    Applicant: VITO NV

    Inventor： MULLENS, Steven ,  PROTASOVA, Lidia ,  DANACI, Simge ,  VANGENEUGDEN, Dirk

    IPC: A61F2/30 ,  A61F2/34

    Abstract: A surgical implant (10), comprising a porous structure (11) with interconnected pores (20) for ingrowth of bone into the porous structure. The porous structure comprises an arrangement of fibres (13, 14) which are attached to one another, the fibres being arranged in layers (151, 152, 153), the layers being stacked. The porous structure comprises a surface (111), wherein the surface comprises different regions (112, 113) having different porosities. A method of making the above surgical implant is described.

    METHOD AND DEVICE FOR ATMOSPHERIC PRESSURE PLASMA TREATMENT
    8.
    发明申请
    METHOD AND DEVICE FOR ATMOSPHERIC PRESSURE PLASMA TREATMENT 审中-公开
    用于大气压力等离子体处理的方法和装置

    公开(公告)号：WO2012004175A1

    公开(公告)日：2012-01-12

    申请号：PCT/EP2011/060954

    申请日：2011-06-29

    Applicant: VITO NV ,  VANGENEUGDEN, Dirk ,  VAN HOOF, Erwin ,  REGO, Robby

    Inventor： VANGENEUGDEN, Dirk ,  VAN HOOF, Erwin ,  REGO, Robby

    IPC: B29C59/14 ,  H01J37/32 ,  H05H1/24

    CPC classification number: C23C16/545 ,  B29C59/14 ,  B29C2059/145 ,  B29C2059/147 ,  D06M10/025 ,  H01J37/32091 ,  H01J37/32559 ,  H01J37/3277 ,  H01J37/32825 ,  H05H1/2406 ,  H05H2001/2412

    Abstract: A continuous plasma treatment process, said process comprising the steps of: providing a plasma treatment apparatus, said apparatus comprising at least one plasma treatment zone, said plasma treatment zone comprising a pair of electrodes with endless dielectric belts each having a first and a second side and each covering an electrode of said pair of electrodes; producing a non-thermal plasma in a process gas at a pressure of 100 Pa to 1 MPa in the space between said pair of endless dielectric belt-covered electrodes by applying a voltage between said electrode pair; providing a web material to be treated such that it can be transported by said two endless dielectric belts in such a way that there is an area in the plane of said belt at least about 5 mm on either side of said web material on the side of said endless dielectric belts with no part thereof facing one electrode of said pair of electrodes; transporting said web material using said endless dielectric belts in frictional contact with said electrodes such that the side of said web material not in contact with said endless dielectric belts is treated in two passes through said at least one plasma treatment zone while at the same time the exposed parts of the endless dielectric belts transporting said web material are also treated; and cleaning said parts of said endless dielectric belts treated with said plasma using a cleaning station outside said plasma treatment zone prior to said endless dielectric belts re-entering said plasma treatment zone, wherein said electrodes have a length in the transport direction of said endless dielectric belts of at least 10 mm; and an apparatus comprising: at least one plasma treatment zone, said plasma treatment zone comprising a pair of electrodes with endless dielectric belts each having a first and a second side and each covering an electrode of said pair of electrodes; a voltage power supply for each plasma treatment zone connected to said pair of electrodes such that a non-thermal plasma can be produced upon applying a voltage to said electrode pairs in a process gas in the space between each pair of endless dielectric belt-covered electrodes; each of said electrodes in said plasma treatment zone having a discharge surface and said discharge surface being in contact with a first side of said endless dielectric belts thereby shielding said discharge surfaces and the respective sides of the endless dielectric belts in contact with said electrodes from products of said non-thermal plasma; a means of transporting a web material to be treated comprising said endless dielectric belts; a process gas supply; rollers for driving/guiding said endless dielectric belts; and a cleaning station capable of cleaning products of said plasma treatment on the second sides of said endless dielectric belts therefrom.

    Abstract translation: 一种连续等离子体处理方法，所述方法包括以下步骤：提供等离子体处理装置，所述装置包括至少一个等离子体处理区，所述等离子体处理区包括一对电极，每个电极具有第一和第二侧 并且每个覆盖所述一对电极的电极; 通过在所述电极对之间施加电压，在所述一对环形绝缘带覆盖电极之间的空间中在100Pa〜1MPa的压力下在工艺气体中产生非热等离子体; 提供待处理的网状材料，使得其可以由所述两个环形介质带传送，使得在所述带材的平面中存在至少约5mm的所述纤维网材料的两侧上的区域 所述环形绝缘带不具有面对所述一对电极的一个电极的部分; 使用与所述电极摩擦接触的所述环形介质带传送所述网状材料，使得不与所述环形绝缘带接触的所述纤维网材料的一侧在两次通过所述至少一个等离子体处理区域的同时被处理，同时 传送所述纤维网材料的环形绝缘带的暴露部分也被处理; 以及在所述环形绝缘带重新进入所述等离子体处理区之前，在所述等离子体处理区之外的清洁站清洗用所述等离子体处理的所述环形绝缘带的所述部分，其中所述电极在所述环形电介质的输送方向上具有长度 至少10毫米的皮带; 以及一种装置，包括：至少一个等离子体处理区，所述等离子体处理区包括一对具有环形绝缘带的电极，每个电极具有第一和第二侧，并且各自覆盖所述一对电极的电极; 连接到所述一对电极的每个等离子体处理区域的电压电源，使得可以在每对环形绝缘带覆盖电极之间的空间中的处理气体中对所述电极对施加电压时可以产生非热等离子体 ; 所述等离子体处理区中的每个所述电极具有放电表面，并且所述放电表面与所述环形绝缘带的第一侧接触，从而屏蔽所述放电表面和与所述电极接触的环形绝缘带的相应侧面与产品 的所述非热等离子体; 输送待处理的网状材料的方法，包括所述环形绝缘带; 工艺气体供应; 用于驱动/引导所述环形介质带的辊子; 以及能够在所述环形绝缘带的第二侧上清洁所述等离子体处理的产品的清洁站。

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