LIGHT SOURCE GENERATION APPARATUS, LIGHT SOURCE GENERATING METHOD, AND RELATED DEFECT DETECTION SYSTEM

    公开(公告)号:WO2021251966A8

    公开(公告)日:2021-12-16

    申请号:PCT/US2020/037128

    申请日:2020-06-11

    Abstract: An EUV radiation light source generation apparatus includes a pump laser, at least one pulse shaping unit, a wavelength conversion unit, and a high-order harmonics generation unit. The pump laser provides a pulse laser radiation beam. Each pulse shaping unit conducts a spectrum extending operation and a phase compensation operation to the pulse laser radiation beam. The phase compensation operation makes multiple frequency components of the pulse laser radiation beam emitted by the pulse shaping unit to be substantially in phase. The wavelength conversion unit conducts a center wavelength conversion operation to the pulse laser radiation beam. The high-order harmonics generation unit receives the pulse laser radiation beam processed by the pulse shaping unit and the center wavelength conversion operation, and focuses the received pulse laser radiation beam to a high order harmonic generation medium to generate a high order harmonic radiation beam.

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