公开(公告)号：WO2022231939A1

公开(公告)日：2022-11-03

申请号：PCT/US2022/025745

申请日：2022-04-21

申请人： ELEMENTAL SCIENTIFIC, INC.

发明人： WIEDERIN, Daniel, R. ,  BARRETT, Gary, J. ,  WIEDERIN, Kevin

IPC分类号： H05H1/30 ,  H05H1/28 ,  H05H1/34

摘要： An inductively coupled plasma (ICP) torch is described that includes a tapered outer end. A system embodiment includes, but is not limited to, a tubular sample injector configured to receive an aerosolized sample in an interior defined by walls of the tubular sample injector; an inner tube surrounding at least a portion of the tubular sample injector to form a first annular space between the inner tube and the walls of the tubular sample injector, the inner tube defining at least one inlet port for introduction of an auxiliary gas into the first annular space; and an outer tube surrounding at least a. portion of the inner tube to form a. second annular space, the outer tube defining at least one inlet port for introduction of a cooling gas into the second, annular space, the outer tube having a flared region at an outlet of the outer tube.

公开(公告)号：WO2022001342A1

公开(公告)日：2022-01-06

申请号：PCT/CN2021/090880

申请日：2021-04-29

申请人： 安徽纯源镀膜科技有限公司

发明人： 张心凤

IPC分类号： H05H1/28 ,  C23C14/35 ,  C23C14/325 ,  C23C16/513 ,  H01J2237/002 ,  H01J2237/332 ,  H01J37/32357 ,  H01J37/32807 ,  H05H1/24

摘要： 一种用于等离子体传送的传输通道装置及镀膜设备，用于等离子体传送的传输通道装置包括通道本体(100)，通道本体(100)内形成供等离子体通过的A通道(110)，A通道(110)的两端分别构成A入口(120)和A出口(130)，通道本体(100)上或其旁侧设置有对通道本体(100)进行冷却的冷却单元，和/或，通道本体(100)的内壁上设置有用于吸附等离子体中杂质组分(00b)的吸附单元。通过在通道本体(100)上或其旁侧设置冷却单元，对通道本体(100)进行冷却，从而能够实现对通道本体(100)进行散热降温的目的；通过在通道本体(100)的内壁上设置吸附单元，实现对等离子体中杂质组分(00b)的吸附，从而提高效果。应用该传输通道装置的镀膜设备，能够保证传输通道装置持续发挥稳定的过滤效果和提高镀膜质量。

公开(公告)号：WO2021155874A1

公开(公告)日：2021-08-12

申请号：PCT/CZ2021/050015

申请日：2021-02-04

申请人： B&BARTONI, SPOL. S R.O. ,  COMTES FHT A.S.

发明人： CHUMCHAL, Roman ,  HODEK, Josef

IPC分类号： H05H1/34 ,  H05H1/38 ,  H05H1/28 ,  H05H1/32 ,  H05H1/341 ,  H05H1/3436 ,  H05H1/3442 ,  H05H1/48

摘要： Electrode assembly (1) of the plasma arc torch according to the invention has an electrode holder (20) detachably connected to a replaceable part (10) of the electrode, wherein the electrode holder (20) is formed substantially in the shape of a hollow cylinder, the rear end of which is adapted to be connected to the plasma arc torch; and wherein the replaceable part (10) of the electrode is formed in the shape of a rotationally symmetrical body, at the front end of which an emissive insert (12) is coaxially mounted; wherein the front end of the electrode holder (20) extends into an inner space (18) of the electrode replaceable part (10) and comprises a first contact surface (25); the front end of the replaceable part (10) of the electrode has a second contact surface (13) on the inside of the inner space (18) in conductive contact with the first contact surface (25); and wherein the second contact surface (13) is immediately followed by a cooled surface (16) along its entire circumference, at least partially exposed to the cooling medium.

公开(公告)号：WO2020153685A1

公开(公告)日：2020-07-30

申请号：PCT/KR2020/000924

申请日：2020-01-20

申请人： 엘지전자 주식회사

发明人： 박현우 ,  김우일 ,  이계광 ,  조임준

IPC分类号： H05H1/34 ,  H05H1/28

摘要： 본 발명은 열플라즈마를 효율적으로 이용할 수 있고, 처리가스의 열분해를 위한 반응시간을 확보할 수 있는 열플라즈마 처리장치에 관한 것이다. 본 발명의 일 실시예에 따른 열플라즈마 처리장치는, 음극과 양극 사이에 아크가 발생되고, 상기 음극과 양극 사이에 아크에 의해 열 분해될 처리가스가 주입되는 토치부; 상기 음극과 양극에 연결되고, 상기 음극과 양극 사이에 고전압을 인가하는 전원공급부; 및 상기 토치부와 연통되고, 상기 토치부를 통과한 처리가스에 난류를 형성시키는 반응부;를 포함한다.

公开(公告)号：WO2018202827A1

公开(公告)日：2018-11-08

申请号：PCT/EP2018/061453

申请日：2018-05-04

申请人： UMICORE AG & CO. KG

发明人： LEAMON, David ,  CONNER, Thomas ,  REITMEYER, Dustin

IPC分类号： H05H1/28 ,  H05H1/42

CPC分类号： H05H1/42 ,  H05H1/28

摘要： The present invention pertains to a plasma gun for use with low melting point materials or with materials that melt prematurely during processing in plasma guns and plasma systems is disclosed, along with methods for using such materials in a plasma apparatus. The plasma gun can also be used with low boiling point materials or with materials that boil prematurely during processing in plasma guns and plasma systems. The plasma gun and the methods disclosed can be used with materials such as nickel.

公开(公告)号：WO2017171136A1

公开(公告)日：2017-10-05

申请号：PCT/KR2016/006159

申请日：2016-06-10

申请人： 황원규

发明人： 황원규

IPC分类号： H05H1/26 ,  H05H1/28 ,  H05H1/34 ,  B23K10/00 ,  B23K37/02

CPC分类号： B23K10/00 ,  B23K37/02 ,  H05H1/26 ,  H05H1/28 ,  H05H1/34

摘要： 본 명세서에서는 단부가 티트(Teat) 형상으로 가공된 전극과, 내측면이 상기 전극의 단부와 대응되는 형상으로 형성된 노즐을 구비함으로써, 작동 가스가 자연스럽게 회전(Swirling)하며, 분출되는 플라즈마 토치가 개시된다.

摘要翻译：

在本说明书中，端titeu（乳头）由电极，所述内表面加工成具有形成在与所述电极端对应的形状的喷嘴的形状，工作气体被旋转（旋流）自然 披露了要喷射的等离子炬。

公开(公告)号：WO2015184420A1

公开(公告)日：2015-12-03

申请号：PCT/US2015/033424

申请日：2015-05-29

申请人： HYPERTHERM, INC.

发明人： ROBERTS, Jesse A. ,  PATEL, Shreyansh ,  EICKHOFF, Stephen T. ,  GULLOTTA, Justin ,  LIU, Qinghua ,  BOROWY, Dennis M. ,  DUAN, Zheng ,  RETNASWAMY, Ashok V. ,  KIM, Sung Je

IPC分类号： H05H1/28 ,  H05H1/34

CPC分类号： B23K10/00 ,  H05H1/28 ,  H05H1/34 ,  H05H1/3405 ,  H05H2001/3468 ,  H05H2001/3478 ,  H05H2001/3489 ,  H05H2245/125

摘要： In some aspects, electrodes can include a front portion shaped to matingly engage a nozzle of the plasma cutting system, the front portion having a first end comprising a plasma arc emitter disposed therein; and a rear portion thermally connected to a second end of the front portion, the rear portion shaped to slidingly engage with a complementary swirl ring of the plasma cutting system and including: an annular mating feature extending radially from a proximal end of the rear portion of the electrode to define a first annular width to interface with the swirl ring, the annular mating feature comprising a sealing member configured to form a dynamic seal with the swirl ring to inhibit a flow of a gas from a forward side of the annular mating feature to a rearward side of the annular mating feature.

摘要翻译： 在一些方面，电极可以包括成形为匹配地接合等离子切割系统的喷嘴的前部，前部具有包括设置在其中的等离子弧发射器的第一端; 以及后部，其热连接到所述前部的第二端，所述后部成形为与所述等离子体切割系统的互补旋转环滑动接合，并且包括：从所述等离子体切割系统的后部的近端径向延伸的环形配合特征 所述电极限定与所述涡旋环相接的第一环形宽度，所述环形配合特征包括密封构件，所述密封构件构造成与所述涡旋环形成动态密封，以阻止气体从所述环形配合特征的前侧流到 环形配合特征的后侧。

公开(公告)号：WO2015160058A1

公开(公告)日：2015-10-22

申请号：PCT/KR2014/010121

申请日：2014-10-27

申请人： 주식회사 클린팩터스

发明人： 고경오 ,  강경두 ,  노명근

IPC分类号： H01L21/02 ,  H05H1/46 ,  H05H1/28

CPC分类号： H05H1/2406 ,  H05H2001/2412 ,  H05H2245/1215

摘要： 본 발명은, 공정설비에서 발생되는 배기가스 처리 플라즈마 반응기에 관한 것으로서, 공정 챔버에서 배출되는 배기가스를 분해하도록 공정챔버와 진공펌프 사이에 배치되는 플라즈마 반응기에 있어서, 상기 배기가스가 유동하며, 유전체로 형성된 도관; 상기 도관 상에 설치되어, 상기 도관의 내부 공간과 차폐되는 제1 전극부; 및 상기 제1 전극부와 이격되어 배치되며, 상기 제1 전극부와 플라즈마 방전을 일으켜서 상기 배기가스를 분해하는 제2 전극부를 포함하고, 상기 플라즈마 방전에 의한 상기 도관의 손상을 방지하기 위하여, 상기 도관의 두께는 상기 플라즈마 방전이 집중되는 부분의 두께가 주변 부분의 두께보다 두껍게 형성된다.

摘要翻译： 本发明涉及一种用于处理从处理设备产生的废气的等离子体反应器，更具体地，涉及一种布置在处理室和真空泵之间的等离子体反应器，以便溶解从处理室排出的废气，包括： 由废气流过的电介质制成的管; 第一电极部，其安装在所述管上并与所述管的内部空间隔离; 以及第二电极部分，其与第一电极部分分离，用于通过引起等离子体放电来溶解排气，其中管的厚度形成为使得等离子体放电浓缩的区域比厚度厚 的周围区域，以防止等离子体放电对管造成损坏。

公开(公告)号：WO2015132657A1

公开(公告)日：2015-09-11

申请号：PCT/IB2015/000297

申请日：2015-03-09

申请人： LINCOLN GLOBAL INC.

发明人： WINN, Jackie, Laverne ,  NAMBURU, Praveen, Krishna

IPC分类号： H05H1/28 ,  H05H1/34

CPC分类号： H05H1/34 ,  H05H1/28 ,  H05H2001/3426 ,  H05H2001/3436

摘要： A plasma arc torch (100, 400) includes a cathode adaptor body (501) having at least two sealant channels with sealant rings. The torch (100, 400) also includes a cathode body (505) having at least two sealant channels with sealant rings. The torch (100, 400) further includes a pilot arc connector (509) having at least two sealant channels with sealant rings. The torch (100, 400) additionally includes a rear isolator (513, 513') that includes at least two sealant channels with sealant rings that engage an anode body (519) and are spaced apart from each other by a distance that is in a range of 2 percent to 50 percent of an over all length of the rear isolator (513, 513'). The rear isolator (513, 513') also includes at least two sealant channels with sealant rings that engage a ring isolator (521) and are spaced apart from each other by a distance that is in a range of 2 percent to 50 percent of the overall length of the rear isolator (513, 513').

摘要翻译： 等离子弧焊炬（100,400）包括具有至少两个具有密封环的密封剂通道的阴极适配器本体（501）。 手电筒（100,400）还包括具有密封剂环的至少两个密封剂通道的阴极体（505）。 所述手电筒（100,400）还包括具有密封剂环的至少两个密封剂通道的先导弧形连接器（509）。 所述手电筒（100,400）还包括后隔离器（513,513'），所述后隔离器包括至少两个密封剂通道，所述密封剂通道具有接合阳极体（519）的密封环，并且彼此隔开距离为 范围为后隔离器（513,513'）的全长的2％至50％。 后隔离器（513,513'）还包括具有密封环的至少两个密封剂通道，该密封剂通道与环形隔离件（521）接合并且彼此隔开一定距离，该距离在该隔离件的2％至50％的范围内 后隔离器（513,513'）的总长度。

公开(公告)号：WO2014124521A1

公开(公告)日：2014-08-21

申请号：PCT/CA2014/000108

申请日：2014-02-17

申请人： PYROGENESIS CANADA INC.

发明人： RAO, Lakshminarayana Mydala Prahlada ,  REMILLARD, Jocelyn ,  CARABIN, Pierre

IPC分类号： H05H1/26 ,  H05H1/28

CPC分类号： H05H1/42 ,  H05H1/28 ,  H05H1/34 ,  H05H1/36 ,  H05H2001/3426 ,  H05H2001/3468

摘要： A high power DC steam plasma torch system (S) includes a steam plasma torch assembly (1) wherein superheated steam (46) is used as the main plasma forming gas, thereby resulting in a very reactive steam plasma plume. The superheated steam (46) is injected internally directly into the plasma plume via a ceramic lined steam feed tube (25) for reducing condensation of steam before reaching the plasma plume. The superheated steam (46) flows through a gas vortex (16) which has tangentially drilled holes thereby resulting in a high speed gas swirl that minimizes electrode erosion. In the present steam plasma torch system (S), the plasma torch assembly (1) is ignited using an ignition contactor which is housed external to the plasma torch assembly (1). The superheated steam (46) is injected into the plasma plume using a water cooled steam vortex generator assembly (15).

摘要翻译： 高功率DC蒸汽等离子体焰炬系统（S）包括蒸汽等离子体炬组件（1），其中过热蒸汽（46）用作主等离子体形成气体，从而导致非常反应的蒸气等离子体羽流。 过热蒸汽（46）通过陶瓷内衬蒸汽进料管（25）内部直接注入到等离子体羽流中，用于在到达等离子体羽流之前减少蒸汽冷凝。 过热蒸汽（46）流过具有切向钻孔的气体涡流（16），从而导致高速气体涡流，使电极腐蚀最小化。 在本蒸汽等离子体焰炬系统（S）中，使用位于等离子体焰炬组件（1）外部的点火式接触器来点燃等离子炬组件（1）。 使用水冷蒸汽涡流发生器组件（15）将过热蒸汽（46）注入到等离子体羽流中。