The invention discloses a plasma source, which consists of a helix tube, a cathode and an anode, wherein, both ends of the helix tube are communicated with the cathode and the anode respectively; thehelix tube is made of a hollow conductor tube, the interior of which is cooled by water flow, and the outside surface of which is insulated; a DC power supply is arranged among the anode, the helix tube and the cathode; an anode of the DC power supply is communicated with the anode, and a cathode of the DC power supply is communicated with the cathode. The plasma source of the invention is characterized by connection between a single end with the power supply, large self-strengthening plasma, plasma purity, hollow and light electrode, shift between a straight state and a bent state for the spiral tube, large ranges for the adjustment of diameter and length, flexible layout, etc. The plasma source of the invention can be applied in an evaporation method and a low-pressure vapor deposition.