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发明授权
CN101263432B 微光刻曝光系统的光学系统 有权

微光刻曝光系统的光学系统
摘要：
根据本发明的一个方面，一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，具有光学系统轴(0A)和由三个双折射元件(211，212，213)构成的至少一个元件组(200)，每个双折射元件由光学单轴材料制成并具有非球面，其中所述组的第一双折射元件(211)具有其光学晶轴的第一取向；所述组的第二双折射元件(212)具有其光学晶轴的第二取向，其中所述第二取向能够被描述为由所述第一取向的旋转形成，所述旋转不对应于绕光学系统轴旋转90°或其整数倍的角的旋转；所述组的第三双折射元件(213)具有其光学晶轴的第三取向，其中所述第三取向能够被描述为由所述第二取向的旋转形成，所述旋转不对应于绕光学系统轴旋转90°或其整数倍的角的旋转。
摘要（英）：

An optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, according to one aspect of the present invention has an optical system axis (OA) and at least one element group (200) consisting of three birefringent elements (211 ,212,213) each of which being made of optically uniaxial material and having an aspheric surface, wherein a first birefringent element (211 ) of said group has a first orientation of its optical crystal axis, a second birefringent element (212) of said group has a second orientation of its optical crystal axis, wherein said second orientation can be described as emerging from a rotation of said first orientation, said rotation not corresponding to a rotation around the optical system axis by an angle of 90 degrees or an integer multiple thereof, and a third birefringent element (213) of said group has a third orientation of its optical crystal axis, wherein said third orientation can be described as emerging from a rotation of said second orientation said rotation not corresponding to a rotation around the optical system axis by an angle of 90 degrees or an integer multiple thereof.

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