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发明公开
CN101271890A 半导体器件及其制造方法与电容器结构及其制造方法 失效 - 权利终止

半导体器件及其制造方法与电容器结构及其制造方法
摘要：
本发明公开一种半导体器件及其制造方法与电容器结构及其制造方法。该半导体器件包括转接板和半导体芯片。转接板包括：Si衬底；多个通路，通过绝缘材料在穿过Si衬底的相应通孔中设置；薄膜电容器，设置于Si衬底的第一主表面上，以使其电连接至通路；以及多个外部连接端子，设置于Si衬底的第二主表面上，以使其电连接至通路。第二主表面背对第一主表面。半导体芯片设置于第一主表面或第二主表面上，以使其电连接至通路。其中Si衬底的厚度小于通孔的直径。由此，可提供可高频运行及可低成本制造的半导体器件。
摘要（英）：

A semiconductor device is disclosed that includes an interposer and a semiconductor chip. The interposer includes a Si substrate; multiple through vias provided through an insulating material in corresponding through holes passing through the Si substrate; a thin film capacitor provided on a first main surface of the Si substrate so as to be electrically connected to the through vias; and multiple external connection terminals provided on a second main surface of the Si substrate so as to be electrically connected to the through vias. The second main surface faces away from the first main surface. The semiconductor chip is provided on one of the first main surface and the second main surface so as to be electrically connected to the through vias. The Si substrate has a thickness less than the diameter of the through holes.

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