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发明公开
CN101353779A Al－Ni－La－Si体系Al－基合金溅射靶及其制备方法 有权

Al－Ni－La－Si体系Al－基合金溅射靶及其制备方法
摘要：
本发明涉及一种含有Ni、La和Si的Al－Ni－La－Si体系Al－基合金溅射靶，其中当使用扫描电子显微镜以2000倍的放大倍数观察在垂直于所述溅射靶的平面的横截面中从(1/4)t至(3/4)t(t：厚度)的截面时，(1)按面积分数计，平均粒径为0.3μm至3μm的Al－Ni体系金属间化合物的总面积相对于全部Al－Ni体系金属间化合物的总面积为70％以上，所述Al－Ni体系金属间化合物主要由Al和Ni组成；并且(2)按面积分数计，平均粒径为0.2μm至2μm的Al－Ni－La－Si体系金属间化合物的总面积相对于全部Al－Ni－La－Si体系金属间化合物的总面积为70％以上，所述Al－Ni－La－Si体系金属间化合物主要由Al、Ni、La和Si组成。
摘要（英）：

The present invention relates to an Al-Ni-La-Si system Al-based alloy sputtering target including Ni, La and Si, in which, when a section from ( 1/4 )t to ( 3/4 )t (t: thickness) in a cross section vertical to a plane of the sputtering target is observed with a scanning electron microscope at a magnification of 2000 times, (1) a total area of an Al-Ni system intermetallic compound having an average particle diameter of 0.3 mum to 3 mum with respect to a total area of the entire Al-Ni system intermetallic compound is 70% or more in terms of an area fraction, the Al-Ni system intermetallic compound being mainly composed of Al and Ni; and (2) a total area of an Al-Ni-La-Si system intermetallic compound having an average particle diameter of 0.2 mum to 2 mum with respect to a total area of the entire Al-Ni-La-Si system intermetallic compound is 70% or more in terms of an area fraction, the Al-Ni-La-Si system intermetallic compound being mainly composed of Al, Ni, La, and Si.

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