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发明公开
CN101359188A 带状工件的曝光装置及带状工件的曝光装置的聚焦调整方法 有权

带状工件的曝光装置及带状工件的曝光装置的聚焦调整方法
摘要：
本发明的课题是实现可在曝光处理途中进行聚焦调整，且无须追加聚焦调整专用的照明单元或显像单元，就可以在短时间内调整聚焦。在将形成于掩模(M)的图案投影在带状工件(W)、并进行曝光的带状工件的曝光装置中，在掩模(M)的对准标记(MAM)的内侧形成投影透镜用聚焦调整图案(FP)。此外，在工件台(10)的贯通孔或缺口(10a)上配置光透过部件(10b)，而形成对准显微镜用聚焦调整图案(AP)。由对准显微镜(12)检测掩模与带状工件的对准标记，并进行掩模(M)与带状工件(W)的对位，接着，通过对准显微镜(12)，检测投影透镜用聚焦调整图案(FP)与上述对准显微镜用聚焦调整图案(AP)并进行聚焦调整。
摘要（英）：

The project of the invention is to achieve focusing regulation during exposure treatment, does not need to increase a lighting unit or a developing unit, and can regulate focus in a short time. A pattern formed in a mask (M) is projected in a band workpiece (W), and a focusing regulation pattern (FP) for a projection lens is formed inside a mask target (MAM) of the mask (M) in an exposure device for exposing the band workpiece. Moreover, a light transmission component (10b) is arranged on a communicating pore or a nick (10a) of a workbench (10), so as to form a focusing regulation pattern (AP) for an aligning microscope. The aligning microscope (12) detects the aligning mark of the mask and the band workpiece, aligns the mask (M) and the band workpiece (W), and then, the aligning microscope (12) detects the focusing regulation pattern (FP) for the projection lens and the focusing regulation pattern (AP) for the aligning microscope and regulates the focus.

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