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CN101385127A 用于减少介电蚀刻中微粒污染的密封弹性材料粘合的Si电极等 有权

用于减少介电蚀刻中微粒污染的密封弹性材料粘合的Si电极等
摘要：
一种用于半导体基片处理的等离子反应室的电极组件，其包含具有粘合表面的衬垫构件，具有在一侧的下部表面和在另一侧的粘合表面的内部电极，以及具有在一侧的下部表面和在另一侧的粘合表面的外部电极。至少一个上述电极具有法兰，该法兰在另一个电极的该下部表面的至少一部分下面延伸。
摘要（英）：

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing having a backing member having a bonding surface, an inner electrode having a lower surface on one side and a bonding surface on the other side, and an outer electrode having a lower surface on one side and a bonding surface on the other side. At least one of the electrodes has a flange, which extends underneath at least a portion of the lower surface of the other electrode.

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