The invention relates to a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure. The invention is characterized in: the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: Rx-Q3-O-Q2-Y1-SO3-Z+ ... (b1-1); wherein Rx represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; Q2 and Q3 each independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).