The invention discloses a developing machine, which is provided with a control device capable of performing time delay control to gas of a spray nozzle. The spray nozzle is used for spraying developing solvent or rinsing liquid. The distance between the spray nozzle and a silicon wafer is more than or equal to 5cm. The developing machine stops after the time delay for a period of time; and during liquid spraying, a time relay works to control an electromagnetic valve to open the gas, and the gas is closed with time delay when the liquid spraying stops. At the same time the distance between the spray nozzle and the silicon wafer is more than or equal to 5cm, otherwise the mist liquid will remain on the silicon wafer and form impurity. Because the time delay of the time relay is adjustable and can change with the changes of a procedure, the liquid spraying effect of the spray nozzle reaches the optimum. The developing machine not only has less investment cost, but also solves the existing problems and improves the quality and the qualification rate of products.