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发明授权
CN101540274B 基板处理系统的洗净方法和基板处理系统 有权

基板处理系统的洗净方法和基板处理系统
摘要：
本发明提供一种基板处理系统的洗净方法和基板处理系统，能够在适当条件下适当地洗净收容室。在基板处理系统(10)中，系统控制器(25)的CPU执行如下洗净处理，在此后要执行的制品处理与以批次执行的最初的制品处理相当时，在后面的批次和前面的批次的时间间隔在预先设定的规定时间以内，且在之前的批次中执行的最后的制品处理的种类与在后面执行的最初的制品处理的种类相同的情况下，对制品处理的执行次数累加“1”，对包含累加后的制品处理实施的晶片(W)的批次，参照已设定的系统方案，执行在该系统方案中记载的与腔室(21)对应的清洗处理。
摘要（英）：

The invention provides a cleaning method for a substrate processing system and substrate processing system capable of appropriately cleaning a housing chamber. In the substrate processing system, the CPU of the system controller executes cleaning treatment as follow: the number of execution times of product processing is incremented by ''1 '', if the product processing to be executed next corresponds to first product processing for a subsequent lot, a time interval between preceding and subsequent lots is not longer than a predetermined time period, and a type of the last product processing performed for the preceding lot is the same as that of the first product processing to be performed for the subsequent lot. A cleaning treatment is executed, which corresponds to a chamber indicated ina system recipe set for a lot including a wafer on which the product processing is performed immediately before execution of the cleaning treatment.

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