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发明授权
CN101819927B 一种微纳结构硅材料的制备系统与制备方法 失效 - 权利终止

一种微纳结构硅材料的制备系统与制备方法
摘要：
一种微纳结构硅材料的制备系统，特点是：反射镜、连续可调衰减片、光快门、透镜和三维调整台固定在光学平台上，不锈钢长腔真空室安装在三维调整台上，不锈钢长腔真空室前端有窗片，其内部的后表面粘贴有硅片，外部与真空室充气管道连接，所述管道上设置有两个微调阀，光快门通过导线与脉冲计数器连接。通过连续可调衰减片调节入射激光功率，配合使用脉冲计数器准确控制蚀刻的脉冲数量，并利用微调阀门调节真空室内气体压强，最终实现各种不同形貌的微纳结构硅材料的形成。本发明生产工艺简单，操作便捷，所得微纳结构的硅材料具有跨度超过2500nm的吸收光谱，且反射率低于10％。
摘要（英）：

The invention discloses a system for preparing a micro/nano structured silicon materials, which is characterized in that: a reflecting mirror, a continuous tunable attenuation plate, a light shutter, a lens and a three-dimensional adjusting platform are fixed on an optical platform; a stainless steel long-cavity vacuum chamber is arranged on the three-dimensional adjusting platform; the front endof the stainless steel long-cavity vacuum chamber is provided with a window plate; a silicon plate is adhered to the rear surface inside the stainless steel long-cavity vacuum chamber; the exterior of the stainless steel long-cavity vacuum chamber is connected with a vacuum chamber filling pipeline; two fine adjustment valves are arranged on the pipeline; and the light shutter is connected with apulse counter through a lead. By using the continuous tunable attenuation plate to adjust the power of incident laser, matching the pulse number of the pulse counter for accurately controlling the etching, and adjusting the gas pressure inside the vacuum chamber by using the fine adjustment valves, various micro/nano structured silicon materials in different appearances are finally formed. The system for preparing the micro/nano structured silicon materials has the advantages of simple production process and convenient operation; the obtained micro/nano structured silicon materials have an absorption spectrum with the span of over 2,500nm, and the reflectivity of less than 10 percent.

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