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发明授权
CN102005358B 带电粒子束曝光系统 有权 转让

带电粒子束曝光系统
摘要：
本发明涉及一种用于将图案转移到目标的表面上的带电粒子束曝光装置，包括：射束发生器，它包括基本在一个平面中的多个n个带电粒子源(1)，每个源适合于产生带电粒子束；第一孔径阵列(4)，它包括多组孔径，每组孔径对准一个源，以将每个射束分裂成多个细射束m，从而导致总共n×m个细射束；以及偏转器阵列(6)，它包括多组偏转器，每组偏转器对准一个源和一组孔径，一个组中的每个偏转器对准相应组的孔径，并且每组偏转器可用于确证对其相应射束的准直影响。
摘要（英）：

The invention relates to a charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources (1), substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array (4), comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of nxm beamlets, and a deflector array (6), comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.

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