利索-全球专利检索

  1. 登录
  2. 注册
发明公开
CN102144285A 静电吸盘装置和基片的吸附状态判断方法 失效 - 权利终止

静电吸盘装置和基片的吸附状态判断方法
摘要：
本发明提供具有能够迅速且正确地把握基片的吸附状态的吸附判断单元的静电吸盘装置，并提供能够迅速且正确地把握静电吸盘装置中的基片的吸附状态的基片的吸附状态判断方法。该静电吸盘装置在金属基盘的上表面侧具有吸附基片的静电吸盘，其特征在于：具有用来判断基片的吸附状态的吸附判断单元。该基片的吸附状态判断方法是在静电吸盘装置中判断基片的吸附状态的方法，该静电吸盘装置在金属基盘的上表面侧具有吸附基片的静电吸盘，其特征在于：利用热流束传感器得到通过静电吸盘传递的来自基片的热流，从而判断基片的吸附状态。
摘要（英）：

Provided is an electrostatic chuck device comprising adsorption determining means capable of quickly and accurately grasping the adsorbed state of a wafer. Furthermore, provided is a method for determining the adsorbed state of the wafer, whereby it is possible to quickly and accurately grasp the adsorbed state of the wafer in the electrostatic chuck device. The electrostatic chuck device in which an electrostatic chuck for adsorbing the wafer is provided on the upper surface side of a metal substrate is characterized in that the electrostatic chuck device comprises the adsorption determiningmeans for determining the adsorbed state of the wafer. Furthermore, the method for determining the adsorbed state of the wafer in the electrostatic chuck device in which the electrostatic chuck for adsorbing the wafer is provided on the upper surface side of the metal substrate is characterized in that the flow of the heat from the wafer transferred via the electrostatic chuck is obtained by heatflux sensors to determine the absorbed state of the wafer.

公开/授权文献
0/0