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发明公开
CN102422389A 使用等离子体鞘工程的加化蚀刻与沉积剖面控制 有权

使用等离子体鞘工程的加化蚀刻与沉积剖面控制
摘要：
使用等离子体处理工具在工件上沉积材料。举例而言，揭示一种用于材料的保形沉积的方法。在此实施例中，等离子体鞘形状经修改以允许材料以某一范围的入射角冲击所述工件。藉由随时间过去而改变此入射角范围，可在上面沉积多种不同特征。在另一实施例中，使用等离子体处理工具来蚀刻工件。在此实施例中，等离子体鞘形状经更改以允许离子以某一范围的入射角冲击工件。藉由随时间过去而改变此入射角范围，可形成多种不同形状的特征。
摘要（英）：

A plasma processing tool is used to deposit material on a workpiece. For example, a method for conformal deposition of material is disclosed, in this embodiment, the plasma sheath shape is modified to allow material to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of different features can be deposited onto. In another embodiment, a plasma processing tool is used to etch a workpiece. In this embodiment, the plasma sheath shape is altered to allow ions to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of differently shaped features can be created.

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