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发明公开
CN102938423A 一种用于硅基薄膜太阳能电池的新型复合n层薄膜 无效 - 撤回

一种用于硅基薄膜太阳能电池的新型复合n层薄膜
摘要：
本发明公开了一种用于硅基薄膜太阳能电池的新型复合n层薄膜，其包括至少一层n型微晶氧化硅层和至少一层n型微晶硅层，其中，n型微晶氧化硅（μc-SiOx:H）材料的折射率范围在1.5-2.5，薄膜总厚度范围在1纳米-150纳米。利用本发明，能够有效提高硅基薄膜太阳能电池短路电流密度和转化效率。此发明可以应用于硅基薄膜太阳能电池的工业生产。
摘要（英）：

The invention discloses a novel composite n-layer thin film for a silicon-based thin film solar cell. The novel composite n-layer thin film comprises at least one layer of n-type microcrystalline silicon oxide layer and at least one layer of n-type microcrystalline silicon layer, wherein the refractive index range of an n-type microcrystalline silicon oxide (mu c-SiOx:H) material is 1.5-2.5, and the total thickness range of the thin film is 1-150 nanometers. By means of the novel composite n-layer thin film, short-circuit current density and transformation efficiency of the silicon-based thin film solar cell can be effectively improved. The novel composite n-layer thin film can be applied to industrial production of the silicon-based thin film solar cell.

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