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发明公开
CN103243314A 成膜装置 有权

成膜装置
摘要：
本发明提供一种成膜装置，该成膜装置包括：旋转台；第1处理气体供给部，其用于向第1处理区域供给第1处理气体；第1等离子体处理部，其用于在第2处理区域中对基板进行等离子体处理；分离气体供给部，其用于向形成于第1处理区域和第2处理区域之间的分离区域供给分离气体，以便使第1处理区域的气氛气体和第2处理区域的气氛气体分离，第1等离子体处理部包括：第1围绕部分，其用于划分形成用于使等离子体产生的等离子体产生空间，在其下部形成有等离子体的喷出口；第2处理气体供给部，其用于向等离子体产生空间供给第2处理气体；活化部，其用于使等离子体产生空间的第2处理气体活化；第2围绕部分，其设在第1围绕部分的下方。
摘要（英）：

Disclosed is a film deposition apparatus including a turntable, a first processing gas supplying portion for supplying first processing gas to a first processing area, a first plasma processing unit which performs a plasma process to a substrate at a second process area, a separating gas supplying portion for supplying separating gas to a separation area between the first processing area and the second processing area to separate the gases of the first processing area and the second processing area, wherein the first plasma processing unit includes a first surrounding portion for forming a plasma generation space where plasma is generated, provided with a discharge port at a lower end portion, a second process gas supplying unit which supplies a second process gas to a plasma generation space, an activating unit which activates the second process gas in the plasma generation space, and a second surrounding portion provided below the first surrounding portion.

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