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发明公开
CN103972012A 反应腔室及具有它的等离子体设备 无效 - 驳回

反应腔室及具有它的等离子体设备
摘要：
本发明公开了一种反应腔室及具有它的等离子体设备，反应腔室包括：腔体，腔体内具有反应腔；诱导环形件，诱导环形件设在反应腔内，用于减弱反应腔中心处的磁场强度且增强反应腔外周缘处的磁场强度。根据本发明的反应腔室，反应腔室内具有诱导环形件，诱导环形件可以通过改变反应腔内的磁场强度而降低反应腔中心处等离子体密度，增加反应腔边缘的等离子体密度，从而降低反应腔边缘与中心区域等离子体密度差异，改善等离子体分布的均匀性，有利于晶圆或工件产品的开发。
摘要（英）：

The invention discloses a reaction chamber and plasma equipment with the same. The reaction chamber comprises a chamber body and an induction ring part. A main reaction chamber body is formed in the chamber body. The induction ring part is arranged in the main reaction chamber body and used for weakening the magnetic field intensity in the center of the main reaction chamber body and reinforcing the magnetic field intensity on the outer periphery of the main reaction chamber body. According to the reaction chamber, the induction ring part is arranged in the reaction chamber and can reduce the plasma density in the center of the main reaction chamber body and increase the plasma density on the edge of the main reaction chamber body by changing the magnetic field intensity in the main reaction chamber body, and therefore the difference between the plasma density on the edge of the main reaction chamber body and the plasma density in the center of the main reaction chamber body can be reduced, the uniformity of plasma distribution can be improved, and development of wafers or work-piece products is easy.

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