The invention relates to a continuous deposition method of a refractive index matching layer in shadow eliminating glass. The method comprises the following steps: (a) sputtering a target material by using a first working gas to deposit atoms of the target material on a substrate; (b) sputtering the target material by using a second working gas to deposit the atoms of the target material on the substrate. According to the method, by adopting a magnetron sputtering method, the preparation of the refractive index matching layer can be realized only through changing the introduced gas under the condition that the target is not changed; the refractive index matching layer is simple in structure, convenient in preparation and low in cost and is capable of effectively eliminating the etching shadow, so that the method is beneficial to the large-scale production of enterprises.