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发明公开
CN104183605A 一种显示装置、阵列基板及其制作方法 无效 - 驳回

一种显示装置、阵列基板及其制作方法
摘要：
本发明涉及显示工艺技术领域，特别涉及一种显示装置、阵列基板及其制作方法，该阵列基板包括：有源层以及位于有源层上方的源漏电极，所述有源层包括第一有源层和第二有源层，所述第二有源层的含氧量小于第一有源层的含氧量；所述第二有源层处于源漏电极和第一有源层之间，且位于源漏电极与第一有源层接触的区域。本发明提供的显示装置、阵列基板及其制作方法，可有效省掉刻蚀阻挡层的制作，并且可以增强有源层与源漏电极的接触电阻，提高界面接触性，减少氧化物中陷阱态的缺陷，增强氧化物半导体的信赖性，提高产品的良品率。
摘要（英）：

The invention relates to a display apparatus, and an array substrate and a manufacture method thereof. The array substrate comprises an active layer and a source-drain electrode disposed above the active layer. The active layer comprises a first active layer and a second an active layer. The oxygen content of the second active layer is smaller than the oxygen content of the first active layer. The second active layer is disposed between the source-drain electrode and the first active layer and is disposed at an area where the source-drain electrode and the first active layer are in contact. By using the display apparatus, and the array substrate and the manufacture method thereof, the manufacture of an etching barrier layer can be effectively omitted, the contact resistance between the active layer and the source-drain electrode can be enhanced, the interface contact is improved, the defect of a trap state in an oxide is reduced, the reliability of an oxide semiconductor is enhanced, and the product yield rate is improved.

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