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发明授权
CN104217979B 基板清洗装置和基板清洗方法 有权

基板清洗装置和基板清洗方法
摘要：
本发明提供基板清洗装置、基板清洗方法。一边使基板旋转一边向基板的中心部依次喷射清洗液和气体，在使喷射清洗液和气体的喷嘴朝向基板的周缘侧移动之后，切换至设定在自第1清洗液喷嘴的移动轨迹偏离的位置上的第2清洗液喷嘴来喷射清洗液，一边喷射清洗液并喷射气体一边使两个喷嘴朝向基板的周缘侧移动，以使自第2清洗液喷嘴的喷射位置起到基板的中心部为止的距离与自气体喷嘴的喷射位置起到基板的中心部为止的距离之间的差逐渐变小的方式使各喷嘴移动。
摘要（英）：

A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.

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