The invention discloses a novel magnetic field structure for vacuum ion plating equipment. The novel magnetic field structure comprises a target seat, a magnet seat and an internal cooling device, wherein a target groove for accommodating and fixing a target is formed in the top end of the target seat; protruded auxiliary anodes are arranged at the two ends of the target; the bottom of the target is arranged in a cathode body groove; a permanent magnet is arranged between a cathode body and an aluminum plate, and clings to the top surface of the aluminum plate; the bottom of the target seat is connected with a bracket through a thread in a screwing way; an electromagnetic coil provided with a coil shield and supported by a coil skeleton is arranged below the aluminum plate; the bottom of the target is connected with the bracket through the thread in the screwing way; the cooling device is a water passage fixed in the center of an arc ion plating device. According to the novel magnetic field structure, the electromagnetic coil and the permanent magnet or carbon steel are arranged to co-act on a magnetic field on the surface of an arc target, so that convenience is brought to regulation, the generated magnetic field is better in shape, the ablation efficiency of the target can be effectively improved, and the film forming quality can be improved.