The invention provides a wet etching machine and a method for carrying out etching by adopting the etching machine. The wet etching machine comprises an etching chamber, wherein the etching chamber is internally provided with at least two etching layers, the etching layers are sequentially arranged in a laminated mode from top to bottom, and each etching layer comprises a first conveying carrier which is used for placing and conveying a substrate to be etched and a spraying device which is arranged right above the first conveying carrier and used for spraying an etching liquid medicine. By adopting the etching machine and the method provided by the invention, a problem of a wet etching machine in the prior art that the production takt is reduced because the dwell time needs to be increased or the occupied area is large because the number of parallelly connected etching chambers needs to be increased when the production processes requires the total etching time to be greater than the conveying time under a circumstance that the substrate does not stop can be solved.