The invention provides a high-responsibility surface enhanced Raman scattering active substrate and a production method thereof. The active substrate comprises an III-V semiconductor substrate with a porous gully surface and Au nanoparticles distributed on the III-V semiconductor substrate. The method comprises the following steps: etching the surface of a substrate to form a rough surface; and depositing the Au nanoparticles on the surface of the substrate with a porous gully surface through an electrochemical deposition technology. The production method has the advantages of simplicity, low cost and easy realization; and the surface enhanced Raman scattering active substrate produced through the method has no nanoparticle agglomeration phenomenon, and has very high electric field intensity, long photo-induced carrier life and high Raman signal intensity, so the surface enhanced Raman scattering active substrate has high reuse rate and detection sensitivity, thereby the surface enhanced Raman scattering active substrate can be used in ultralow molecular concentration SERS detection, and can be widely used.