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发明公开
CN105027268A 基板处理装置以及基板处理方法 有权

基板处理装置以及基板处理方法
摘要：
实施方式涉及的基板处理装置(1)具备：支撑基板W的工作台(4)；向该工作台(4)上的基板W的表面供给挥发性溶剂的溶剂供给部(8)；对供给有挥发性溶剂的基板W照射光，并作为对基板W进行加热以使在供给有该挥发性溶剂的基板W的表面产生气层并使挥发性溶剂成为液体珠的加热部而发挥作用的照射部(10)。由此，能够抑制图案的倒塌并且进行良好的基板干燥。
摘要（英）：

A substrate processing device (1) according to an embodiment comprises: a table (4) which supports a substrate W; a solvent supply unit (8) for supplying the surface of a substrate W on the table (4) with a volatile solvent; and an irradiation unit (10) which functions as a heater for heating the substrate W to change the volatile solvent into liquid droplets with an air layer generated on the surface of the substrate W supplied with the volatile solvent by irradiating the substrate W supplied with the volatile solvent with light. Thereby, it is possible to favorably dry a substrate while suppressing the collapse of a pattern.

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