The invention relates to the technical field of display, and in particular to a cleaning system for wet etching. The cleaning system comprises a cleaning unit, an etching section, a buffer section and a cleaning section, wherein the etching section, the buffer section and the cleaning section are communicated in sequence. An air knife unit is arranged on an inlet of the cleaning section, and the cleaning unit is arranged corresponding to the air knife unit and used for cleaning the air knife unit. According to the cleaning system, etching liquid crystals and dust particles attached to edges and peripheries of air knives are effectively removed through the cleaning unit. The cleaning system can replace manpower to clean the air knives, the working ratio of equipment is increased, the cleaning effect is ensured, and meanwhile manpower waste is reduced to the maximum extent. Meanwhile, the situation that due to the fact that an equipment chamber is opened for a long time, particles in the equipment are increased, and the yield of products is influenced can be avoided.