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发明公开
CN105312999A 无应力抛光设备及其工艺腔体 无效 - 驳回

无应力抛光设备及其工艺腔体
摘要：
本发明提供了一种无应力抛光设备及其工艺腔体，该工艺腔体包括：正极槽，所述正极槽的底部具有正极槽排口，所述正极槽的底部表面向所述正极槽排口倾斜，以使所述正极槽内的抛光液在重力作用下流向所述正极槽排口；负极槽，所述负极槽的底部具有负极槽排口，所述负极槽的底部表面向所述负极槽排口倾斜，以使所述负极槽内的抛光液在重力作用下流向所述负极槽排口。本发明能够促进抛光液的循环，使得腔体内无存液或存液较少。
摘要（英）：

The invention provides SFP (stress-free polish) equipment and a technological cavity thereof. The technological cavity comprises a positive pole trough and a negative pole trough, wherein a positive pole trough discharge port is formed in the bottom of the positive pole trough, and the bottom surface of the positive pole trough inclines to the positive pole trough discharge port, so that polishing slurry in the positive pole trough can flow to the positive pole trough discharge port under the effect of gravity; a negative pole trough discharge port is formed in the bottom of the negative pole trough, the bottom surface of the negative pole trough inclines to the negative pole trough discharge port, and accordingly, the polishing slurry in the negative pole trough can flow to the negative pole trough discharge port under the effect of gravity. The technological cavity can promote circulation of the polishing slurry, so that no slurry or less slurry is left in the cavity.

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