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发明授权
CN105603390B 具有主动冷却型格栅的气体分配装置 有权

具有主动冷却型格栅的气体分配装置
摘要：
本发明涉及具有主动冷却型格栅的气体分配装置。用于衬底处理系统的格栅组件包括第一部分，该第一部分包括：第一主体，其限定中心开口；入口；出口；以及上歧管，其位于第一主体中，并且，与入口或出口流体连通。第二部分布置成与第一部分相邻，并且，包括限定中心开口的第二主体。多个管布置于第二主体的中心开口中。多个管中的第一管与上歧管流体连通。下歧管位于第二主体中，并且，与入口或出口中的另一个流体连通。多个管中的第二管与下歧管流体连通。格栅组件布置在远程等离子体源与衬底之间。
摘要（英）：

A grid assembly for a substrate processing system includes a first portion including a first body defining a central opening, an inlet, an outlet, and an upper manifold that is located in the first body and that is in fluid communication with the inlet or the outlet. A second portion is arranged adjacent to the first portion and includes a second body defining a central opening. A plurality of tubes is arranged in the central opening of the second body. First ones of the plurality of tubes are in fluid communication with the upper manifold. A lower manifold is located in the second body and is in fluid communication with the other one of the inlet or the outlet. Second ones of the plurality of tubes are in fluid communication with the lower manifold. The grid assembly is arranged between a remote plasma source and a substrate.

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