利索-全球专利检索

  1. 登录
  2. 注册
发明授权
CN105917445B 具有空间原子层沉积的自对准式双图案化 有权

具有空间原子层沉积的自对准式双图案化
摘要：
提供了自对准式双图案化方法，所述方法包括特征修整。在单个批处理腔室中执行SADP工艺，在所述单个批处理腔室中，基板在处理腔室的被气体幕分开的区段之间侧向移动，使得每个区段独立地具有工艺条件。
摘要（英）：

Provided are self-aligned double patterning methods including feature trimming. The SADP process is performed in a single batch processing chamber in which the substrate is laterally moved between sections of the processing chamber separated by gas curtains so that each section independently has a process condition.

公开/授权文献
0/0