The invention discloses a corrosion solution and a method of analyzing a deep submicron SOI (Silicon On Insulator) process chip. The method comprises steps: a characteristic corrosion solution is used for corroding silicon dioxide on the device layer of a to-be-detected chip, wherein the characteristic corrosion solution comprises hydrofluoric acid, a silicon dioxide etching solution, glycerin and water; the to-be-detected chip after corrosion is cleaned by deionized water and dried; the to-be-detected chip after being dried is placed in a reactive acid dyeing solution for dyeing processing, wherein the reactive acid dyeing solution comprises hydrofluoric acid, nitric acid and glacial acetic acid; and the type of the to-be-detected chip is determined according to image data of the to-be-detected chip after being dyed acquired by a scanning electron microscope. The characteristic corrosion solution can realize uniform corrosion, the reaction speed can be effectively reduced, the success rate is ensured, and the device layer can be kept flatly; and the to-be-detected chip after being dyed is extremely flat, and the type of the to-be-detected chip can be determined conveniently and quickly.