The present invention provides an evaluation method of a crystal defect, a method of manufacturing a silicon wafer, and an apparatus for evaluating crystal defects, which suppress variation in the evaluation result between the measurement persons. The method for evaluating crystal defects is characterized in that a process of developing a crystal defect in the silicon wafer is performed on a silicon wafer (step S1), a surface of the silicon wafer is photographed next to acquire an image (step S2), and then the above image The differential processing and the binarization processing are sequentially performed (step S3), and the crystal defects in the silicon wafer are evaluated based on the image subjected to the binarization processing (step S4).