A method of manufacturing a layer for a plurality of thin film transistors for display manufacturing and an apparatus therefore is described. The method includes depositing (101) a layer stack onto asubstrate by sputtering a first layer with a first set of processing parameters from an indium oxide containing target; sputtering a second set of processing parameters different from the first set ofprocessing parameters onto the first layer from an indium oxide containing target a second layer with, and patterning (102) the layer stack by etching. The apparatus (200) includes a vacuum chamber (210); one or more indium oxide containing targets (220a, 220b) within the vacuum chamber for sputtering a transparent conductive oxide layer; a gas distribution system (230) for providing a processinggas within the vacuum chamber; and a controller (240) connected to the gas distribution system (230) and configured to execute a program code for conducting the method.