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发明授权
CN107627202B 化学机械抛光垫复合抛光层配制品 有权

化学机械抛光垫复合抛光层配制品
摘要：
提供一种化学机械抛光垫，其含有：具有抛光表面的抛光层；其中所述抛光层包含第一连续非短效聚合物相和第二非短效聚合物相；其中所述第一连续非短效聚合物相具有多个周期性凹座；其中所述多个周期性凹座由所述第二非短效聚合物相所占据；其中所述第一连续非短效聚合物相的开孔孔隙率≤6体积％；其中所述第二非短效聚合物相的开孔孔隙率≥10体积％；以及其中所述抛光表面适于抛光衬底。
摘要（英）：

A chemical mechanical polishing pad is provided containing: a polishing layer having a polishing surface; wherein the polishing layer comprises a first continuous non-fugitive polymeric phase and a second non-fugitive polymeric phase; wherein the first continuous non-fugitive polymeric phase has a plurality of periodic recesses; wherein the plurality of periodic recesses are occupied with the second non-fugitive polymeric phase; wherein the first continuous non-fugitive polymeric phase has an open cell porosity of ≦6 vol %; wherein the second non-fugitive polymeric phase contains an open cell porosity of ≧10 vol %; and, wherein the polishing surface is adapted for polishing a substrate.

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